The measurement of the electrical properties of thin films is essential for their use as conduction or isolating layers in micro electrical devices. If one such parameter is insufficient it would result in the failure of the component. The measurement methods include 2-point-measurement of resistor structures, determination of the resistivity of thin films using the Kelvin method (4-point probe method), on well known structures, or the Van der Pauw method, on partially known geometries. The dielectric strength of isolating layers is of particular interest in microsystems like sensors and actuators.
Jakob BirkhölzerIMP Institut für Mikrotechnik und PhotonikWissenschaftlicher Mitarbeiter, Experte für Röntgenanalytik
+41 58 257 34 60jakob.birkhoelzer@ost.ch